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Department of Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand
Publications: Alkaisi MM
Alkaisi M. M., Blaikie R. J., McNab S. J., Cheung R., Cumming D. R. S. 1999. Sub-diffraction-limited patterning using evanescent near-field optical lithography. Appl. Phys. Let. 75, 3560-3562. [find in index, source]
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